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Topic: Excimer Lasers

Results

Broadband tunable excimer lasers

1985 / IEEE
By: Tittel, F.K.; Wilson, W.L.; Nighan, W.;

Fabrication of Polymer Waveguides by Laser Ablation Using a 355 nm Wavelength Nd:YAG Laser

2011 / IEEE
By: Kai Wang; Kandulski, W.; Calver, J.; Rygate, J.; Zakariyah, S.S.; Selviah, D.R.; Hutt, D.A.; Conway, P.P.;

High-Pressure Microdischarges: Sources of Ultraviolet Radiation

2012 / IEEE
By: Weidong Zhu; Schoenbach, K.H.;

Different Phenomena in UV-Induced Surface Flashover

2012 / IEEE
By: Jianjun Deng; Le Xu; Meng Wang;

Description of HPM Generation in Atmospheric Air Using the Laser and Klystron Terminology

2012 / IEEE
By: Kekez, M.M.;

High-Efficiency Ultraviolet Inscription of Bragg Gratings in Microfibers

2012 / IEEE
By: Bai-Ou Guan; Jie Li; Li-Peng Sun; Yan-Nan Tan; Long Jin; Yang Ran;

Diamond Detectors for UV and X-Ray Source Imaging

2012 / IEEE
By: Trucchi, D.M.; Conte, G.; Allegrini, P.; Girolami, M.; Salvatori, S.; Ralchenko, V.G.;

A Novel SONOS Memory With Recessed-Channel Poly-Si TFT via Excimer Laser Crystallization

2012 / IEEE
By: Chao-Lung Wang; Po-Yu Yang; Hsu-Hang Kuo; Chun-Chien Tsai; I-Che Lee; Huang-Chung Cheng;

Nonvolatile Poly-Si TFT Charge-Trap Flash Memory With Engineered Tunnel Barrier

2012 / IEEE
By: Won-Ju Cho; Hee-Wook You;

New Pixel Circuit Design Employing an Additional Pixel Line Insertion in AMOLED Displays Composed by Excimer Laser-Crystallized TFTs

2012 / IEEE
By: Jonghyun Song; Sungchul Kim; Moojin Kim; Sangmoo Choi; Guanghai Jin;

Current status of pulse-power technology and applications at LBT, Nagaoka

1992 / IEEE / 000-0-0000-0000-0
By: Masugata, K.; Masuda, W.; Yatsui, K.; Kang, X.D.; Jiang, W.; Sonegawa, T.; Imada, G.; Sekimoto, Y.;

Large-aperture e-beam pumped excimer lasers for ICF

1992 / IEEE / 000-0-0000-0000-0
By: Kuznetsov, V.E.; Ovsyannikov, V.A.; Jeremkin, V.V.; Vodovosov, V.M.; Vasilevsky, M.A.; Burtsev, V.A.; Bolshakov, E.P.; Streltsov, A.P.; Baranov, V.Y.; Chetvertkov, V.L.; Cheraobrovin, V.I.; Finkelstein, K.I.; Pidelskaya, R.F.; Prokopenko, V.F.; Peohersky, O.P.;

Optimization and Analysis on Ion Mobility Spectrometer Based on a Laser Ionization Source

2011 / IEEE / 978-1-4577-0860-2
By: Ji Ren-dong; Wang Xiao-yan;

Improving plated copper adhesion for metallisation of glass PCBs

2011 / IEEE / 978-1-4577-1769-7
By: Baofeng He; Leach, R.; Petzing, J.; Webb, D.P.;

Optics optimization of 10�m resolution used for the smart phone's PCB and ITO lithography

2011 / IEEE / 978-1-4577-0246-4
By: Liang Lei; Jinyun Zhou; Wenyan Pei; Qinghua Lin;

Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect

2011 / IEEE / 978-1-4577-1516-7
By: Jiun-Jie Chao; Shu-Chia Shiu; Shih-Che Hung; Ching-Fuh Lin;

Modeling of XeCl excilamps on binary mixtures in mono-pulse regime of work

2011 / IEEE / 978-1-61284-813-6
By: Znosko, K.F.; Volodenkov, A.P.; Anufrik, S.S.;

The XeCl laser with the adjustable shape and duration of generation pulse

2011 / IEEE / 978-1-61284-813-6
By: Znosko, K.F.; Volodenkov, A.P.; Anufrik, S.S.;

Modeling of XeCl excilamps in pulse-periodic mode of work

2011 / IEEE / 978-1-61284-813-6
By: Znosko, K.F.; Volodenkov, A.P.; Anufrik, S.S.;

Gas lasers pumped by the generators with inductive energy storage and semiconductor opening switch

2011 / IEEE / 978-1-4577-0631-8
By: Panchenko, A.N.; Tel'minov, A.E.; Tarasenko, V.F.;

Selective gold film removal from multilayer substrates

2011 / IEEE / 978-0-9775657-8-8
By: Simpson, M.C.; Rohde, C.A.; Meladze, M.; MacMillan, F.; Ware, H.;

Epitaxial thin films of half-metallic CrO2 deposited on oxidized Si substrates by PLD using Cr2O3 target

2011 / IEEE / 978-1-4673-0074-2
By: Dwivedi, S.; Biswas, S.;

Fabrication of narrow comb-shaped electret by removing charge using excimer laser beam from charge-implanted CYTOP film for avoiding electrostatic repulsion problem

2012 / IEEE / 978-1-4673-0325-5
By: Onishi, J.; Matsushita, T.; Takahashi, T.; Wada, T.; Nishida, T.; Aoyagi, S.; Suzuki, M.; Yoshikawa, Y.;

DBD excimer lamp power supply with fully controlled operating conditions

2012 / IEEE / 978-1-4673-1653-8
By: Piquet, H.; Hay, K.; Diez, R.; Florez, D.;

Strong $\hbox{LP}_{01}$ and $\hbox{LP}_{11}$ Mutual Coupling Conversion in a Two-Mode Fiber Bragg Grating

2012 / IEEE
By: Chan, F.Y.M.; Tse, M.-L.V.; Kit Man Chung; Zhengyong Liu; Lau, A.P.T.; Haw-Yaw Tam; Chuang Wu; Chao Lu;

Improved model for the angular dependence of excimer laser ablation rates in polymer materials

2009 / American Institute of Physics
By: J. E. A. Pedder; A. S. Holmes; P. E. Dyer;

Gain of a long-pulse KrCl excimer laser

2007 / American Institute of Physics
By: L. C. Casper; H. M. J. Bastiaens; P. J. M. Peters; K.-J. Boller; R. M. Hofstra;

Atomic and molecular emissions of the laser-induced plasma during zinc and zinc oxide target ablation

2007 / American Institute of Physics
By: S. Acquaviva; E. DAnna; M. L. De Giorgi;

Experimental investigation of ultraviolet laser induced plasma density and temperature evolution in air

2008 / American Institute of Physics
By: Magesh Thiyagarajan; John Scharer;

Tuning of electrical charging effects for ferromagnetic Mn-doped ZnO nanocrystals embedded into a SiO2 layer fabricated by KrF excimer laser irradiation

2009 / American Institute of Physics
By: Sejoon Lee; Deuk Young Kim; Tae Won Kang; Hyung Koun Cho;

Three-channel KrF laser with distributed magnetic-switch-based charging circuit

2006 / American Institute of Physics
By: S. Szatmári; J. Bohus; G. Zhixing; X. Tang; N. Wang;

Pulse stretcher with variable pulse length for excimer laser applications

2010 / American Institute of Physics
By: A. Burkert; J. Bergmann; W. Triebel; U. Natura;

Spatial-time dynamics of the discharge pumping and lasing in a XeCl excimer laser

1988 / IEEE
By: Treshchalov, A.B.; Peet, V.;

1-ns high-power high-repetitive excimer laser oscillator

1988 / IEEE
By: Yamada, K.; Sato, T.; Hasama, T.; Miyazaki, K.;

Injection control of a multipass amplification of a discharge excited XeF (C to A) laser

1988 / IEEE
By: Voges, H.; Marowsky, G.;

Performance characteristics of an injection-controlled electron-beam pumped XeF(C to A) laser system

1988 / IEEE
By: Hamada, N.; Nighan, W.L.; Tittel, F.K.; Wilson, W.L., Jr.; Sauerbrey, R.;

High-power narrow-band operation and Raman frequency conversion of an electron-beam pumped krypton excimer laser

1988 / IEEE
By: Kurosawa, K.; Kato, Y.; Fujiwara, E.; Sasaki, W.;

Gas contaminants produced in electron-beam-pumped XeF lasers

1988 / IEEE
By: Seamans, J.F.; Kimura, W.D.;

Single-state high-beam-quality XeCl laser with a phase-conjugate Brillouin mirror

1988 / IEEE
By: Watanabe, A.; Okabe, M.; Sugii, M.; Sasaki, K.;

Direct bandwidth and polarization control of an XeF unstable resonator laser

1988 / IEEE
By: Smith, M.J.; Litzenberger, L.N.;

Experimental study of a generalized self-filtering unstable resonator applied to an XeCl laser

1988 / IEEE
By: Nassisi, V.; di Lazzaro, P.; Perrone, M.R.;

Analytical model for injection-controlled excimer laser amplifiers

1988 / IEEE
By: Sauerbrey, R.; Hamada, N.; Tittel, F.K.;

Detailed optical characterization of a near diffraction limited xenon fluoride laser

1988 / IEEE
By: Itzkan, I.; Fulghum, S.F.; Berggren, R.; Trainor, D.W.; Smith, M.J.; Londono, C.;

50 J discharge-pumped XeCl laser

1989 / IEEE
By: Sato, T.; Yamada, K.; Miyazaki, K.; Hasama, T.;

Kinetic processes in electron beam-excited XeF (C40aA) laser media

1989 / IEEE
By: Fowler, M.C.; Nighan, W.L.;

Application of a phase-conjugate Brillouin mirror to generation of high-quality variable-duration KrF pulses

1989 / IEEE
By: Kurnit, N.A.; Thomas, S.J.;

Design of a magnetically-isolated pulsed power system for a 1 kW XeCl excimer laser

1988 / IEEE
By: Young, C.; White, E.; Ingwerson, P.; McDonald, K.; Fisher, C.; Sergoyan, E.;

Stimulated Raman scattering in lead vapor heat pipe for tunable and narrow-linewidth XeCl excimer laser

1989 / IEEE
By: Rieger, H.;

Transient refractive index measurements in XeF laser gas mixtures

1989 / IEEE
By: Trainor, D.W.; Fulghum, S.F.; Appel, C.H.;

New high transparent resist and process technology for KrF excimer laser lithography

1988 / IEEE
By: Sasago, M.; Nomura, N.; Hirai, Y.; Nakagawa, H.; Tani, Y.; Endo, M.;

Output energy enhancement of discharge-pumped XeF(B to X) lasers with the two-component halogen donor mixtures

1989 / IEEE
By: Kumagai, H.; Obara, M.;

Theoretical high-efficiency extraction study of a short-pulse electron-beam-pumped ArF laser amplifier with atmospheric pressure Ar-rich mixtures

1989 / IEEE
By: Obara, M.; Kannari, F.; Matsui, E.; Lee, Y.-W.;

Measurements of gain and absorption saturation in an electron-beam-pumped KrF amplifier

1989 / IEEE
By: Fedosejevs, R.; Thompson, D.C.; Manjunath, H.R.; Santiago, J.; Offenberger, A.A.;

High-efficiency XeCl discharge laser with high-brightness SrTiO/sub 3/ corona preionizer

1989 / IEEE
By: Sugii, M.; Hara, H.;

Measurement of intense ultraviolet subpicosecond pulses using degenerate four-wave mixing

1989 / IEEE
By: Engers, T.; Schuler, H.; Schulz, H.; von der Linde, D.;

XeCl laser in biliary calculus fragmentation: fluence threshold and ablation products

1989 / IEEE
By: Mordon, S.R.; Brunetaud, J.M.; Lacroix, B.; Huvenne, J.P.; Wrobel, R.; Bocquet, H.; Niay, P.; Bernage, P.; Descamps, C.;

Pulse generation by spatially-hole-burned distributed feedback lasers

1990 / IEEE
By: Raksi, F.;

Injection locking of a KrF laser using a frequency-doubled argon-ion laser pulse

1990 / IEEE
By: Harwood, B.; Fedosejevs, R.; Shan, X.X.; Offenberger, A.A.; Thompson, D.C.; Yamanaka, C.;

Characteristics of doubling circuits used in gas laser excitation: application to the N/sub 2/ laser

1990 / IEEE
By: Serafetinides, A.A.; Papadopoulos, A.D.;

Excimer-laser ablation and etching

1990 / IEEE
By: Brannon, J.H.;

Injection control of a long-pulse electron-beam pumped XeF (C to A) laser

1990 / IEEE
By: Mandl, A.; Litzenberger, L.N.;

Pulsed 4-MeV electron injector with an excimer laser driven photocathode

1989 / IEEE
By: Carlson, R.L.; Builta, L.A.; Kauppila, T.J.; Ridlon, R.N.; Moir, D.C.;

Time-resolved studies of the C-A transition in avalanche discharges: fluorescence and gain-loss studies

1991 / IEEE
By: Vannini, M.; Sakai, T.; Sze, R.C.; Sentis, M.L.;

Improved excimer laser planarization of AlSi with addition of Ti or Cu

1989 / IEEE
By: Stolz, M.; Carey, P.; Woratschek, B.; Bachmann, F.;

Excimer laser processing of Al-1%Cu/TiW interconnect layers

1989 / IEEE
By: Ritz, K.N.; Broadbent, E.K.; Ong, E.; Maillot, P.;

The use of Ti as an antireflective coating for the laser planarization of Al for VLSI metallization

1989 / IEEE
By: Lai, Y.; Heim, R.; Cheung, K.P.; Liu, R.;

Repetitively pulsed operation of an injection-controlled high-power XeF(C to A) excimer laser

1991 / IEEE
By: Sauerbrey, R.; Dane, C.B.; Hofmann, T.; Yamaguchi, S.; Tittel, F.K.; Wilson, W.L., Jr.;

High repetition rate, wide-aperture KrF lasers for subpicosecond amplification

1991 / IEEE
By: Watanabe, M.; Nakajima, S.; Sajiki, K.; Oeda, Y.; Nodomi, R.; Watanabe, S.;

Stimulated Brillouin scattering of a KrF laser

1991 / IEEE
By: Davis, G.M.; Gower, M.C.;

Computer model of the electron-beam excited XeF(B-X) laser

1991 / IEEE
By: Abarenov, A.V.; Suetin, N.V.; Shugai, J.S.; Rebrick, S.P.; Rakhimov, A.T.; Persiantsev, I.G.;

A high-power long pulse excimer laser

1989 / IEEE
By: Znotins, T.A.; Boyd, G.; McKee, T.J.;

Gain measurements on the KrF(B to X), XeF(B to X), and XeF(C to A) laser transitions in an XeF(C to A) laser gas mixture

1991 / IEEE
By: Wilson, W.L., Jr.; Sauerbrey, R.A.; Hofmann, T.; Cheville, A.; Yamaguchi, S.; Tittel, F.K.;

A 20-J flow-compatible XeCl laser

1991 / IEEE
By: Sergoyan, E.G.; Brown, A.J.W.; Fisher, C.H.; von Dadelszen, M.; White, F.E.;

Selected area channeling pattern, defect etch and lifetime study of silicon implanted with oxygen

1988 / IEEE
By: Stafsudd, O.M.; Nelson, P.; Davis, G.E.; Roitman, P.;

Design and characteristics of high pulse repetition rate and high average power excimer laser systems

1991 / IEEE
By: Sentis, M.L.; Fontaine, B.L.; Forestier, B.M.; Delaporte, P.;

Efficiency characterization of vacuum ultraviolet molecular fluorine (F/sub 2/) laser (157 nm) excited by an intense electric discharge

1991 / IEEE
By: Obara, M.; Kannari, F.; Uematsu, T.; Kakehata, M.;

Optimization of an injection-controlled excimer laser guided by analytical modeling

1991 / IEEE
By: Tittel, F.K.; Sauerbrey, R.; Hofmann, T.; Dane, C.B.;

Return current in large aperture electron-beam-excited KrF lasers

1990 / IEEE
By: Kushner, M.J.;

Scaling characteristics of the XeF (C to A) excimer laser

1990 / IEEE
By: Fowler, M.C.; Yamaguchi, S.; Hirst, G.J.; Dane, C.B.; Hofmann, T.; Nighan, W.L.; Tittel, F.K.; Sauerbrey, R.; Wilson, W.L., Jr.;

Efficient XeF(C to A) laser excited by a coaxial electron beam at intermediate pumping rates

1990 / IEEE
By: Sauerbrey, R.; Bastianens, H.M.J.; Peters, P.J.; Tittel, F.K.; Dane, C.B.;

Modeling of the self-sustained, discharge-excited xenon-chloride laser

1991 / IEEE
By: Turner, M.M.; Smith, P.W.;

Effect of preionization on uniformity of photo-triggered XeCl laser discharges: modeling and comparison with experimental results

1991 / IEEE
By: Zheng, C.; Letardi, T.; Bollanti, S.;

The time-dependent development of the macroscopic instability of a XeCl* laser discharge

1991 / IEEE
By: Bahr, M.; Choroba, S.; Botticher, W.;

Open problems in the XeCl laser physics

1991 / IEEE
By: Longo, S.; Capitelli, M.; Gorse, C.;

Microarcs as a termination mechanism of optical pulses in electric-discharge-excited KrF excimer lasers

1991 / IEEE
By: Kushner, M.J.;

On the application of W/Cu materials in the fields of power engineering and plasma technology

1990 / IEEE
By: Saeger, K.E.; Michal, R.; Krauss-Vogt, W.; Bregel, T.;

Optical exposure systems for three-dimensional fabrication of microprobe

1991 / IEEE / 0-87942-641-1
By: Shoji, S.; Minami, K.; Esashi, M.;

Plasma physics issues in gas discharge laser development

1991 / IEEE
By: Eden, J.G.; Kushner, M.J.; Garscadden, A.;

Characterization of an ultrahigh peak power XeF(C to A) excimer laser system

1992 / IEEE
By: Szabo, G.; Tittel, F.K.; Wilson, W.L., Jr.; Wisoff, P.J.; Dane, C.B.; Sharp, T.E.; Hofmann, T.;

Modeling the induced-phase modulation and compression of UV laser pulses

1992 / IEEE
By: Dinev, S.G.; Dreischuh, A.A.;

Theoretical modeling of an X-ray preionized self-sustained XeCl laser

1992 / IEEE
By: Fu, S.; Fang, H.; Letardi, T.;

Plasma electronics in pulsed nitrogen lasers

1992 / IEEE
By: Pimentel, N.P.; Tsui, K.H.; Silva, A.V.F.; Massone, C.A.;

Biological effects of excimer laser radiation

1992 / IEEE
By: Kochevar, I.E.;

Excimer laser formed vertical links of standard CMOS double-level metallizations

1991 / IEEE / 0-8186-9126-3
By: Hartmann, H.-D.; Hillmann-Ruge, T.;

Formation of vertical links in standard CMOS double-level metallizations by application of Nd:YAG- and excimer-laser radiation

1991 / IEEE / 0-87942-673-X
By: Hillmann-Ruge, T.; Hartmann, H.-D.;

Metal plugs produced by excimer laser melting for submicron interconnection: mechanism, electrical properties

1991 / IEEE / 0-87942-673-X
By: Iizuka, M.; Mukai, R.; Nakano, M.; Kudo, H.;

High-mobility poly-Si TFT's fabricated by a novel excimer laser crystallization method

1992 / IEEE
By: Sugiura, O.; Shimizu, K.; Matsumura, M.;

Cost of ownership for advanced optical lithography

1991 / IEEE / 0-7803-0152-8
By: Stone, S.; DiSessa, P.;

Requirements for temperature measurements in nonequilibrium flows using laser-induced O/sub 2/ fluorescence

1991 / IEEE
By: Laufer, G.; Grinstead, J.H.;

PZT thin films by laser ablation

1990 / IEEE / 0-7803-0190-0
By: Pfeffer, R.L.; Neifeld, R.; Danforth, S.C.; Safari, A.; Ramkumar, K.; Lee, J.; Wrenn, C.;

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