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Topic: 10 Mtorr

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Effect of RF substrate bias on crystalline orientation of chromium and magnetic characteristics of 84% Co-16% Cr films
1990 / IEEE
By: Fisher, R.D.; Nelson, C.W.; Heiman, N.; Khan, M.R.;
Magnetic properties and read-write characteristics of multilayer films on a glass substrate
1988 / IEEE
By: Sono, K.; Ishii, N.; Enjoji, K.; Tsuno, T.; Katayama, S.;
Magnetic and recording characteristics of CoCrTa/Cr thin film media prepared by FT sputtering
1990 / IEEE
By: Naoe, M.; Hasegawa, K.; Kawanabe, T.;
An investigation of the variation of leakage resistance of electrical insulating materials used on spacecraft power systems
1994 / IEEE / 0-7803-1797-1
By: Doreswamy, C.V.; Ford, G.A., II; Bassapa, P.;
The effects of a small transverse magnetic field upon a capacitively coupled RF discharge
1995 / IEEE
By: Hopkins, M.B.; Doyle, R.A.; Turner, M.M.; Hutchinson, D.A.W.;
Simulation images from a low-pressure chlorine plasma reactor using DSMC
1996 / IEEE
By: Wise, R.S.; Lymberopoulos, D.P.; Economou, D.J.; Bartel, T.J.; Johannes, J.;
Electrical characteristics of breakdown phase of a wire ion plasma source
1995 / IEEE / 0-7803-2669-5
By: Okino, A.; Urai, H.; Kwang-Choel Ko; Hotta, E.;
Investigation of the radial uniformity of planar inductively coupled RF discharges using a self-consistent two-dimensional kinetic model
1995 / IEEE / 0-7803-2669-5
By: Kortshagen, U.;
Analytic sheath resolution in high density plasma source simulations
1995 / IEEE / 0-7803-2669-5
By: DiPeso, G.; Vahedi, V.;
Electrothermal frequency tuning of folded and coupled vibrating micromechanical resonators
1998 / IEEE
By: Syms, R.R.A.;
A selected-area CVD method for deposition of sensing films on monolithically integrated gas detectors
1995 / IEEE
By: Wise, K.D.; Gland, J.L.; Schwank, J.W.; Sanjeev Majoo;
Laser initiation and radiofrequency sustainment of seeded air plasmas
2000 / IEEE / 0-7803-5982-8
By: Sund, R.; Paller, E.; Kelly, K.; Gui, H.; Cao, R.; Scharer, J.;
Dependence on axial magnetic field of the radiation from a high power gas-filled backward wave oscillator
2001 / IEEE / 0-7803-7141-0
By: Granatstein, V.L.; Sato, T.; Hayatsu, Y.; Kobayashi, S.; Minami, K.;
Modeling of dry development in bilayer-resist process for 140-nm contact hole patterning
2002 / IEEE
By: Kim, W.D.; Sung Bo Hwang; Edgar, T.F.;
Measurements and models of ion energy distributions in high-density, radio-frequency-biased CF/sub 4/ discharges
2002 / IEEE / 0-7803-7407-X
By: Wang, Y.; Sobolewski, M.A.; Goyette, A.;
Amorphous and microcrystalline silicon films deposited by hot wire cell method: application to silicon based thin film solar cells
2002 / IEEE / 0-7803-7471-1
By: Ide, Y.; Konagai, M.; Yamada, A.; Zhao, Y.; Asakusa, K.;
Atomically resolved investigation of InGaAs/InP heterojunction formation during metalorganic vapor-phase epitaxy
2003 / IEEE / 0-7803-7704-4
By: Chen, G.; Visbeck, S.B.; Li, C.H.; Law, D.C.; Sun, Y.; Hicks, R.F.;
Laser initiation and radiofrequency sustainment of high pressure plasmas
2003 / IEEE / 0-7803-7911-X
By: Tysk, S.; Scharer, J.; Akhtar, K.; Denning, M.;
Carrier scattering caused by antiparallel coupled magnetic domains in Co/Pd multilayers
2005 / IEEE / 0-7803-9009-1
By: Kobayashi, T.; Nakagawa, S.;

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