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1992 / IEEE / 0-7803-0779-8
By: Malesani, L.; Dal Lago, F.; Toigo, I.; Tenti, P.; Spiazzi, G.; Rossetto, L.;
By: Malesani, L.; Dal Lago, F.; Toigo, I.; Tenti, P.; Spiazzi, G.; Rossetto, L.;
1993 / IEEE / 0-7803-1209-0
By: Grishin, B.S.; Zakurdayev, A.D.; Simonov, K.G.; Cherepenin, V.A.; Negirev, A.A.; Belyavsky, B.A.; Lopin, M.I.; Pobedonostev, A.S.;
By: Grishin, B.S.; Zakurdayev, A.D.; Simonov, K.G.; Cherepenin, V.A.; Negirev, A.A.; Belyavsky, B.A.; Lopin, M.I.; Pobedonostev, A.S.;
1994 / IEEE / 0-7803-1328-3
By: Grotstollen, H.; Mende, R.; Frohleke, N.; Vollmer, L.; Margaritis, B.;
By: Grotstollen, H.; Mende, R.; Frohleke, N.; Vollmer, L.; Margaritis, B.;
1995 / IEEE
By: Urban, C.; Ritter, T.; Tonoli, A.; Bornemann, H.J.; Rietschel, H.; Weber, K.; Zaitsev, O.;
By: Urban, C.; Ritter, T.; Tonoli, A.; Bornemann, H.J.; Rietschel, H.; Weber, K.; Zaitsev, O.;
Status of plasma source developments for ion beam and PIII applications at INRS-Energie et Materiaux
1995 / IEEE / 0-7803-2669-5By: Gregory, B.C.; Boucher, C.; Stansfield, B.L.; Sarkissian, A.H.; Martin, F.;
1997 / IEEE
By: Leeb, S.B.; Schultz, A.M.; Jackson, D.K.; Shaw, S.R.; Verghese, G.C.; Mitwalli, A.H.;
By: Leeb, S.B.; Schultz, A.M.; Jackson, D.K.; Shaw, S.R.; Verghese, G.C.; Mitwalli, A.H.;
1997 / IEEE / 0-7803-3767-0
By: Henrion, W.; Fuhs, W.; Elstner, L.; Conrad, E.; Zeimer, U.; Selle, B.; Muller, P.;
By: Henrion, W.; Fuhs, W.; Elstner, L.; Conrad, E.; Zeimer, U.; Selle, B.; Muller, P.;
1998 / IEEE / 0-7803-4489-8
By: Farias, V.J.; Pereira, A.A.; Treviso, C.H.G.; de Freitas, L.C.; Vieira, J.B., Jr.;
By: Farias, V.J.; Pereira, A.A.; Treviso, C.H.G.; de Freitas, L.C.; Vieira, J.B., Jr.;
1998 / IEEE / 0-7803-4455-3
By: Pereira, A.A.; Treviso, C.H.G.; de Freitas, L.C.; Vieira, J.B., Jr.; Farias, V.J.;
By: Pereira, A.A.; Treviso, C.H.G.; de Freitas, L.C.; Vieira, J.B., Jr.; Farias, V.J.;
1999 / IEEE / 0-7803-5293-9
By: Kladas, A.; Kandianis, A.; Vamvakari, A.; Tegopoulos, J.; Manias, S.;
By: Kladas, A.; Kandianis, A.; Vamvakari, A.; Tegopoulos, J.; Manias, S.;
1999 / IEEE / 0-7803-5498-2
By: Matyas, Z.; Ptasinski, K.J.; van Paasen, S.V.B.; Yan, K.; Pemen, A.J.M.; Huijbrechts, P.A.H.J.; Zacharias, P.; Blom, P.P.M.; van Heesch, E.J.M.; Nicoletti, A.; Hultermans, B.O.E.;
By: Matyas, Z.; Ptasinski, K.J.; van Paasen, S.V.B.; Yan, K.; Pemen, A.J.M.; Huijbrechts, P.A.H.J.; Zacharias, P.; Blom, P.P.M.; van Heesch, E.J.M.; Nicoletti, A.; Hultermans, B.O.E.;
2000 / IEEE
By: de Jong, P.; Zanstra, G.J.; Prasinski, K.J.; van der Laan, P.C.T.; Huijbrechts, P.A.H.J.; Pemen, A.J.M.; van Heesch, E.J.M.;
By: de Jong, P.; Zanstra, G.J.; Prasinski, K.J.; van der Laan, P.C.T.; Huijbrechts, P.A.H.J.; Pemen, A.J.M.; van Heesch, E.J.M.;
2000 / IEEE
By: Huijbrechts, P.A.H.J.; Ptasinski, K.J.; Van Paasen, S.V.B.; Keping Yan; Pemen, G.U.A.J.M.; Van Heesch, B.E.J.M.;
By: Huijbrechts, P.A.H.J.; Ptasinski, K.J.; Van Paasen, S.V.B.; Keping Yan; Pemen, G.U.A.J.M.; Van Heesch, B.E.J.M.;
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