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Cesium hydroxide (CsOH): a useful etchant for micromachining silicon

By: Clark, L.D., Jr.; Lund, J.L.; Edell, D.J.;

1988 / IEEE

Description

This item was taken from the IEEE Periodical ' Cesium hydroxide (CsOH): a useful etchant for micromachining silicon ' The CsOH-H/sub 2/O etchant system was studied over a range of concentrations (10%-76% by weight) and temperatures (25-90 degrees C). The etch rates of