Use this resource - and many more! - in your textbook!
AcademicPub holds over eight million pieces of educational content for you to mix-and-match your way.
Cesium hydroxide (CsOH): a useful etchant for micromachining silicon
1988 / IEEE
This item was taken from the IEEE Periodical ' Cesium hydroxide (CsOH): a useful etchant for micromachining silicon ' The CsOH-H/sub 2/O etchant system was studied over a range of concentrations (10%-76% by weight) and temperatures (25-90 degrees C). The etch rates of
Neural Signal Transducer
25 To 90 Degc
Si/sub 3/n/sub 4/