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Topic: Transient Current-time Characteristics
Effects of Film Stress Modulation Using TiN Metal Gate on Stress Engineering and Its Impact on Device Characteristics in Metal Gate/High- $k$ Dielectric SOI FinFETs2008 / IEEE
By: Moon Kim; Jiyoung Kim; Floresca, H.C.; Young Jun Suh; Rino Choi; Byoung Hun Lee; Ji-Woon Yang; Chang Yong Kang; Jungwoo Oh; Jammy, R.; Hsing-Huang Tseng;