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Topic: Mass Spectroscopic Chemical Analysis

Results

Remote Plasma Chemical Vapor Deposition of Carbon Nanotubes and Analysis of Plasma Effect

2011 / IEEE
By: Asaoka, N.; Takayama, J.; Fukuda, Y.; Murayama, A.; Sugawara, H.; Suda, Y.;

Chemical Detection Using the Receptor Density Algorithm

2012 / IEEE
By: Hickey, P.J.; Neal, M.J.; Owens, N.D.L.; Hilder, J.A.; Cairns, S.N.; Tyrrell, A.M.; Timmis, J.; Kilgour, D.P.A.;

Faster Mass Spectrometry-Based Protein Inference: Junction Trees Are More Efficient than Sampling and Marginalization by Enumeration

2012 / IEEE
By: Noble, W.S.; Serang, O.;

Improving X!Tandem on Peptide Identification from Mass Spectrometry by Self-Boosted Percolator

2012 / IEEE
By: Yee Hwa Yang; Zhou, B.B.; Yunping Zhu; Penghao Wang; Jie Ma; Pengyi Yang;

Decontamination of salmonella on sliced fruits and vegetables surfaces using a direct-current, atmospheric-pressure cold plasma

2011 / IEEE / 978-1-61284-329-2
By: Qian Zhang; Weifeng Nian; Yongdong Liang; Haiyan Wu; Peng Sun; WeiDong Zhu; Jing Fang; Jue Zhang;

The Radiochemical Analysis of Gaseous Samples (RAGS) apparatus for nuclear diagnostics at the national ignition facility

2011 / IEEE / 978-1-61284-329-2
By: Jedlovec, D.; Bernstein, L.A.; Stoeffl, W.; Moody, K.J.; Velsko, C.A.; Linden-Levy, A.; Shaughnessy, D.A.; Riddle, A.; Schneider, D.; Tereshatov, E.;

Classification of astrocytomas and oligodendrogliomas from mass spectrometry data using sparse kernel machines

2011 / IEEE / 978-1-4577-1589-1
By: Agar, N.Y.R.; Gholami, B.; Huang, J.; Tannenbaum, A.R.; Haddad, W.M.; Norton, I.;

New generation underwater mass spectrometers for dissolved gases and volatile organic compound detection and in situ monitoring in the oceans

2011 / IEEE / 978-0-933957-39-8
By: McMurtry, G.; Rathbone, J.; Brucker, G.; Kolotyrkina, I.;

Application of iTRAQ quantitative proteomics in identification of serum biomarkers in breast cancer

2011 / IEEE / 978-1-4244-9352-4
By: Sun Kehuan; Gui Zifan; Cao Meiqun; Wu Zhengzhi;

Liver targeting effect of vinegar-baked Radix Bupleuri on oxymatrine in mice

2011 / IEEE / 978-1-4577-1613-3
By: You-Jun Chen; Rui-Zhi Zhao; Jian-xiong Cai;

Model of ion intensity from tandem mass spectra for improved peptide identification and simulation

2011 / IEEE / 978-1-4577-1613-3
By: Southey, B.R.; Fazal, Z.; Rodriguez-Zas, S.L.; Sweedler, J.V.; Sadeque, A.;

Modeling and systematic analysis of LC-MS proteomics pipeline

2011 / IEEE / 978-1-4673-0490-0
By: Dougherty, E.R.; Braga-Neto, U.; Youting Sun;

Prismatic platelet growth of HgI2 with organic additives

2011 / IEEE / 978-1-4673-0120-6
By: McGregor, D.S.; Ariesanti, E.;

Multiple reaction monitoring: Modeling and systematic analysis

2011 / IEEE / 978-1-4673-0490-0
By: Dougherty, E.R.; Braga-Neto, U.M.; Atashpaz-Gargari, E.;

Hypergeometric Similarity Measure for Spatial Analysis in Tissue Imaging Mass Spectrometry

2011 / IEEE / 978-1-4577-1799-4
By: Wang, M.D.; Parry, R.M.; Kaddi, C.;

Keynote: De novo sequencing of novel peptide antibiotics by tandem mass spectrometry

2012 / IEEE / 978-1-4673-1321-6
By: Pevzner, P.;

Cancer Risk Assessment of Volatile Organic Compounds in an Ornament Market in Tianjin, China

2012 / IEEE / 978-0-7695-4706-0
By: Gao Shuang; Wang Zhao; Han Bin; Wang Xiu-Yan; Bai Zhi-Peng;

Serum Metabonomics Study of Systemic Lupus Erythematosus by Rapid Resolution Liquid Chromatography Coupled with Q-TOF Mass Spectrometry

2012 / IEEE / 978-0-7695-4706-0
By: Xinghong Ding; Ying Yu;

Synthesis and Evaluation of a Folate-linked Anti-cancer Prodrug

2012 / IEEE / 978-0-7695-4706-0
By: Cao Jie; Wan Shunan; Tian Junmei; Du Changli; Gu Yueqing; Chi Xuemei;

Noble gas retention in the target during rotating cylindrical magnetron sputtering

2008 / American Institute of Physics
By: S. Mahieu; W. P. Leroy; D. Depla; S. Schreiber; W. Möller;

Secondary ion counting for surface-sensitive chemical analysis of organic compounds using time-of-flight secondary ion mass spectroscopy with cluster ion impact ionization

2011 / American Institute of Physics
By: K. Hirata; Y. Saitoh; A. Chiba; K. Yamada; K. Narumi; Y. Takahashi;

Study of the decomposition of SF/sub 6/ in the presence of water, subjected to gamma irradiation or corona discharges

1988 / IEEE
By: Derdouri, A.; Casanovas, J.; Hergli, R.; Mathieu, J.; Grob, R.;

Gas contaminants produced in electron-beam-pumped XeF lasers

1988 / IEEE
By: Seamans, J.F.; Kimura, W.D.;

Picosecond time-resolved laser mass spectroscopy

1989 / IEEE
By: von der Linde, D.; Danielzik, B.;

Outgassing of CRT shadow mask coatings caused by electron bombardment

1990 / IEEE
By: Yamamoto, M.; Shimoji, S.; Kimura, H.; Koitabashi, M.;

In situ mass spectrometric analysis of the deterioration of polymer surfaces by low pressure AC discharges

1989 / IEEE
By: Sigmond, R.S.; Goldman, M.; Goldman, A.; Sigmond, T.;

Quantitative investigation of impurity distribution in ZMR SOI layers

1989 / IEEE
By: Maes, H.E.; Mertens, P.W.;

Examination of impurities in ISE SOI material

1989 / IEEE
By: Allen, L.P.; Knapp, J.; Zavracky, P.M.;

Volatile species from conductive die attach adhesives

1989 / IEEE
By: Benson, R.C.; deHaas, N.; Phillips, T.E.;

A critical evaluation of RGA testing (military hybrid microcircuits)

1989 / IEEE
By: David, R.F.S.; Friedlander, M.; Shores, A.A.;

Review: capnography and mass-spectrometry in anesthesia

1988 / IEEE / 0-7803-0785-2
By: Frazier, W.T.;

Mass spectrometer studies of hydrogen desorption from hydrided NdFeB

1990 / IEEE
By: Harris, I.R.; McGuiness, P.J.; Williams, A.J.;

Study of plasma chemistry in wire chambers by GC/MS

1990 / IEEE
By: Wise, J.; Williams, M.C.; Hess, D.W.; Kadyk, J.A.;

Catalytic decomposition of S/sub 2/F/sub 10/ and its implications on sampling and detection from SF/sub 6/-insulated equipment

1990 / IEEE
By: Herron, J.T.; Van Brunt, R.J.; Olthoff, J.K.; Harman, G.; Sauers, I.;

Mass spectroscopic study of photolytically driven deposition of gallium arsenide

1989 / IEEE
By: Norton, D.P.; Ajmera, P.K.;

Processing parameters and kinetics of bromination and chlorination in the YBa/sub 2/Cu/sub 3/O/sub 6+x/ system

1991 / IEEE
By: Fluss, M.J.; Glass, R.S.; Chin, A.H.; Back, D.; Liu, J.Z.; Radousky, H.B.; Shelton, R.N.; Klavins, P.; Mosly, W.D.;

Adaptive control of multiplexed closed-circuit anesthesia

1992 / IEEE
By: Jee, G.-I.; Roy, R.J.;

Fourier transform mass spectrometry in an ECR plasma

1989 / IEEE
By: Shohet, J.L.; Brenna, J.T.; Wendt, A.; Friedmann, J.;

The mass spectrometric analysis of drugs and metabolites in urine

1991 / IEEE / 0-7803-0120-X
By: Hwang, D.G.; Lee, M.R.; Hu, S.H.; Chien, C.C.;

Silver-induced volatile species generation from conductive die attach adhesives

1992 / IEEE
By: Benson, R.C.; Goodwin, P.G.; deHaas, N.; Phillips, T.E.;

Determination of Fe/sup 2+/ and Fe/sup 3+/ concentrations in semi-insulating InP:Fe

1992 / IEEE / 0-7803-0522-1
By: Weber, E.R.; Bliss, D.; Bourret, E.D.; Zach, F.X.; Haller, E.E.;

Decomposition of gaseous organic contaminants by surface discharge induced plasma chemical processing-SPCP

1992 / IEEE / 0-7803-0635-X
By: Masuda, S.; Takahashi, T.; Haga, I.; Yamashita, R.; Oda, T.;

Rate of S/sub 2/F/sub 10/ production from negative corona in compressed SF/sub 6/

1992 / IEEE / 0-7803-0649-X
By: Van Brunt, R.J.; Shah, M.; Olthoff, J.K.;

Robust titanate-modified encapsulants for high voltage potting application of multichip module/hybrid IC

1993 / IEEE
By: Wong, C.P.; McBride, R.;

Li/LiCoO/sub 2/ in inorganic electrolyte solution

1992 / IEEE / 0-7803-0552-3
By: Schriever, U.; Dunger, J.; Dreher, J.; Hambitzer, G.;

Field induced gas emission of polymer films

1992 / IEEE / 0-7803-0565-5
By: Eberle, G.; Selle, M.; Eisenmenger, W.; Gompf, B.;

Fluid dynamics analysis of atmospheric thermal silicon oxidation reactors using dispersion models

1992 / IEEE / 0-7803-0817-4
By: Van Wormer, K.; Philipossian, A.;

Robust titanate-modified encapsulants for high voltage potting application of multi-chip module

1993 / IEEE / 0-7803-0794-1
By: Wong, C.P.; McBride, R.;

Multielement profiling analysis of geochemical and environmental samples by inductively coupled plasma-atomic emission spectroscopy (ICP-AES) and inductively coupled plasma-mass spectrometry (ICP-MS)

1994 / IEEE / 0-7803-1880-3
By: Itoh, A.; Haraguchi, H.; Sawatari, H.; Hirose, A.; Hayashi, T.; Fujimori, E.; Takeuchi, A.;

Outgassing of quartz

1994 / IEEE / 0-7803-1945-1
By: Lareau, R.; Murray, R.A.; Pierce, D.E.; Vig, J.R.; Laffey, S.;

Environmental compatibility of perfluoro polyethers, a family of new dielectric fluids

1994 / IEEE / 0-7803-1307-0
By: Mundula, A.; Pompili, M.; Puliti, C.; Mazzetti, C.;

Charge detrapping in PVDF observed by field induced gas emission

1995 / IEEE / 0-7803-2931-7
By: Schmidt, H.; Eisenmenger, W.; Eberle, G.;

The effect of airborne contaminants in the cleanroom for ULSI manufacturing process

1995 / IEEE / 0-7803-2713-6
By: Shimazaki, A.; Nishiki, K.; Tamaoki, M.; Yanagi, S.; Sasaki, Y.;

Surface analysis and application in magnetic hard disk media

1995 / IEEE / 0-7803-2797-7
By: Gopalakrishnan, R.;

Laser desorption of NO and CO from sodium nitrate and calcium carbonate crystals

1996 / IEEE / 0-7803-3175-3
By: Beck, K.M.; Taylor, D.P.; Bradley, R.A.; German, K.A.H.; Hess, W.P.;

Mechanistic studies of hydrophilic wafer bonding and Si exfoliation for SOI fabrication

1996 / IEEE / 0-7803-3315-2
By: Mills, A.P.; Chabal, Y.J.; Marsico, V.; Weldon, M.K.; Hsieh, C.-M.; Goodwin, C.A.; Christman, S.B.; Dennis, B.S.; Pinczuk, A.; Sapjeta, J.B.; Jacobson, D.C.; Chaban, E.E.;

Anomalous peaks in mass spectra; effects of pre-analysis dissociation and charge exchange events

1996 / IEEE / 0-7803-3289-X
By: Johnson, R.C.;

Applications of surface analytical techniques for metals reduction in ion implantation

1996 / IEEE / 0-7803-3289-X
By: Downey, D.F.; Zhiyong Zhao; Sullivan, P.; Eddy, R.J.; Angel, G.;

Use of accelerator mass spectrometry for trace element detection

1996 / IEEE / 0-7803-3289-X
By: Angel, G.; Mehta, S.; Zhao, Z.Y.; Anthony, J.M.; McDaniel, F.D.; Renfrow, S.N.; Datar, S.A.;

Tungsten contamination in BF/sub 2/ implants

1996 / IEEE / 0-7803-3289-X
By: Liebert, R.B.; Kase, M.; Angel, G.C.;

Metals-contamination-reduction program for the Varian EHP-220/500 medium-current ion implanter

1996 / IEEE / 0-7803-3289-X
By: Mack, M.E.; Gammel, G.; Renau, A.; Walther, S.R.; Downey, D.F.; Swenson, D.R.;

Analytical techniques for measuring contamination introduced during ion implantation

1996 / IEEE / 0-7803-3289-X
By: McQuillan, F.; Biswas, S.; Wauk, M.T.; Murrell, A.J.; Chia, V.; Edgell, M.; Kelly, I.; Littlewood, S.;

Process performance of SDS, high pressure hydrides and solid vaporizer feed materials on a 9500/spl times/R ion implanter

1996 / IEEE / 0-7803-3289-X
By: Mcanus, J.; Boyd, W.G., Jr.; Marin, T.;

Oxygen control in Al-based III-V epiwafers by SIMS for yield improvement

1997 / IEEE / 0-7803-3898-7
By: Huang, C.; Mitha, S.; Gao, Y.; Erickson, J.W.;

Improvement of the surface quality of polished InP wafers

1997 / IEEE / 0-7803-3898-7
By: Hardtdegen, H.; Thomas, N.; Regreny, P.; Jacob, G.;

Atom probe determination of the multicomponent material thermo-field microprotrusion parameters

1996 / IEEE / 0-7803-3594-5
By: Shrednik, V.N.; Loginov, M.V.; Kontorovich, E.L.;

Mass-spectrometrical study of neutral component of plasma in gas discharge with metal-hydride cathode

1997 / IEEE / 0-7803-3990-8
By: Ryabchikov, D.L.; Klochko, E.V.; Borisko, V.N.; Bobkov, V.V.; Sidorenko, Y.V.;

Abatement of perfluorocompounds (PFCs) in a microwave tubular reactor using O/sub 2/ as an additive gas

1997 / IEEE
By: Mocella, M.T.; Sawin, H.H.; Heeyeop Chae; Mohindra, V.;

Explosives detection using an ion mobility spectrometer for airport security

1997 / IEEE / 0-7803-3913-4
By: Martinak, D.; Rudolph, A.;

A MEMS electrospray nozzle for mass spectroscopy

1997 / IEEE / 0-7803-3829-4
By: Yu-Chong Tai; Desai, A.; Lee, T.D.; Davis, M.T.;

Detecting aging by-products of SF/sub 6/ using quadrupole mass spectrometry

1997 / IEEE / 0-7803-3851-0
By: Michaelides, J.M.; Papaioannou, I.C.; Dervos, C.T.;

A method for the monitoring of the air-pollution in the operating room caused by anaesthesia agents

1996 / IEEE / 0-7803-3811-1
By: Spyropoulos, B.; Siafake, I.; Dervos, C.;

Chemical and morphological stability of aluminum tris(8-hydroxyquinoline) (Alq/sub 3/): effects in light-emitting devices

1998 / IEEE
By: Xian-Man Zhang; Papadimitrakopoulos, F.; Higginson, K.A.;

Laser ablation time-of-flight mass spectrometric diagnosis of the surface states of porous siliceous materials

1998 / IEEE / 1-55752-339-0
By: Yongcai Long; Can Xu; Yufen Li; Shixiong Qian; Li Zhao;

A comprehensive atomic-level simulator for AlGaAs/GaAs [001] MBE

1998 / IEEE / 0-7503-0556-8
By: Dorsey, D.L.; Venkat, R.; Mahlingam, K.;

Anomalous reactivity of InAs-deposited GaAs surfaces

1998 / IEEE / 0-7803-4220-8
By: Sasaki, M.; Yamamoto, S.;

Recent advances in surface and thin film analysis methods for application to packaging problems

1997 / IEEE / 0-7803-4157-0
By: Hoesler, W.; Budde, K.; Von Criegern, R.; Holzapfel, W.;

Role of physical parameters of bulk semi-insulating GaAs in detection performance of particle detectors

1998 / IEEE / 0-7803-4909-1
By: Necas, V.; Krempasky, M.; Darmo, J.; Dubecky, F.; Sekacova, M.; Bohacek, P.; Pelfer, P.G.;

Remote microwave technology for chamber clean to reduce PFC emissions

1998 / IEEE / 0-7803-4523-1
By: Ridgeway, R.; Filipiak, S.; Langan, J.; Brown, P.T.; Johnson, A.; Mendicino, L.; Atherton, A.; Maroulis, P.; Pearce, R.;

Effects of process parameters on particle formation in SiH/sub 4/-N/sub 2/O PECVD and WF/sub 6/ CVD processes

1998 / IEEE / 0-7803-4380-8
By: Wu, Z.; Nijhawan, S.; McMurry, P.H.; Rao, N.; Campbell, S.A.;

Effect of doping on the thermoelectric properties of iridium silicide thin films

1998 / IEEE / 0-7803-4907-5
By: Heinrich, A.; Pitschke, W.; Kurt, R.; Wetzig, K.; Schumann, J.; Griessmann, H.;

The detection of degraded materials in turbine generators by chemical analysis

1998 / IEEE / 4-88686-050-8
By: Numata, S.; Takashima, N.; Adachi, H.; Minami, S.; Sorita, T.;

Polymer-based electrospray chips for mass spectrometry

1999 / IEEE / 0-7803-5194-0
By: Yu-Chong Tai; Desai, A.; Xuan-Qi Wang; Lee, T.D.; Licklider, L.;

An oxidation study of Cu leadframes

1999 / IEEE / 0-930815-56-4
By: Rosenfield, M.I.; Lowry, R.; Berriche, R.;

Study of key physical parameters of bulk semi-insulating GaAs for radiation detector fabrication

1998 / IEEE / 0-7803-4354-9
By: Pelfer, P.G.; Necas, V.; Krempasky, M.; Darmo, J.; Dubecky, F.; Sekacova, M.; Bohacek, P.;

Copper barrier properties of ultrathin PECVD W/sub x/N

1999 / IEEE / 0-7803-5174-6
By: Danek, M.; Vijayendran, A.;

The performance of two purification media in their removal of impurities from inert gases

1999 / IEEE / 0-7803-5502-4
By: Kondrashov, D.; Jian Wei; Colorado, A.; Vakhshoori, K.;

Generation of LMW components in silicone rubbers

1999 / IEEE / 0-7803-5414-1
By: Karner, H.C.; Herden, A.; Janssen, H.; Lu, Z.W.;

Identification of LMW fluid in HTV silicone rubber

1999 / IEEE / 0-7803-5414-1
By: Hackam, R.; Hui Zhang; Lazarescu, V.;

Accuracy of SIMS in determining ion implanted B doses as confirmed by nuclear reaction analysis

1999 / IEEE / 0-7803-4538-X
By: Magee, C.W.; Gossmann, H.-J.; Jacobson, D.;

Correlation of screen oxide thickness and iron levels introduced during batch high-current implants

1999 / IEEE / 0-7803-4538-X
By: Caputo, D.; Polignano, M.L.; Bertuch, A.F.; Todorov, S.S.;

Medical electronics [Technology 2000 analysis and forecast]

2000 / IEEE
By: Roos, M.;

Actively shielded 8 tesla magnet for FT-ICR mass spectrometry

2000 / IEEE
By: Winger, B.; Wilcox, R.; Ciancetta, G.; King, M.; Devernoe, A.; Rutman, G.; Parizh, M.; Kagan, A.;

Influence of reactive SF/sub x/ gases on electrode surfaces after electrical discharges under SF/sub 6/ atmosphere

2000 / IEEE
By: Beyer, C.; Klockow, D.; Jenett, H.;

On-site investigations of gas insulated substations using ion mobility spectrometry for remote sensing of SF/sub 6/ decomposition

2000 / IEEE / 0-7803-5931-3
By: Baumbach, J.I.; Pilzecker, P.; Trindade, E.;

Uncertainty analysis of feature extraction from expired gas traces

2000 / IEEE / 0-7803-5890-2
By: Gulotta, C.; Parvis, M.; Torchio, R.;

Trace elemental analysis of InP and related process materials by glow-discharge mass-spectrometry (GDMS)

2000 / IEEE / 0-7803-6320-5
By: Efimov, A.; Moreau, O.; Putyera, K.; Kasik, M.;

Laser desorption mass spectrometry for ultrafast DNA analysis and its applications

1996 / IEEE / 1-55752-443-2
By: Allman, S.; Taranenko, N.; YiFei Zhu; Chung-Hsuan W. Chen;

Photofragment imaging applied to atmospheric photochemistry

1996 / IEEE / 1-55752-444-0
By: Syage, J.A.;

Modeling of boron deactivation/activation kinetics during ion implant annealing

2000 / IEEE / 0-7803-6279-9
By: Dunham, S.T.; Chakravarthi, S.;

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Topic: Mass Spectroscopic Chemical Analysis

Results

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