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Topic: Interfacial Siox Layer
Impact of flash annealing on performance and reliability of high-�/metal-gate MOSFETs for sub-45 nm CMOS2007 / IEEE / 978-1-4244-1507-6
By: Rino Choi; Man Chang; Harris, R.; Vora, N.; Kirsch, P.; Young, C.; Bersuker, G.; Heh, D.; Majhi, P.; Kalra, P.; Tsu-Jae King Liu; Jammy, R.; Hsing-Huang Tseng; Hyunsang Hwang; Joonmyoung Lee;