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Effect of UV-Ozone Treatment on the Performance of ZnO TFTs Fabricated by RF Sputtering Deposition Technique

By: Wu, J.; Lin, H.; Kuo, P.; Su, B.; Chu, S.; Chen, Y.; Wu, C.; Chang, C.; Liu, S.;

2014 / IEEE


This item from - IEEE Transaction - Components, Circuits, Devices and Systems - In this paper, bottom-gate thin-film transistors (TFTs) with zinc oxide (ZnO) channels were grown on Si substrates with an SiO2 dielectric layer via the radio-frequency sputtering technique. The ZnO films were then subjected to 16 min of ultraviolet (UV)-ozone treatment, which resulted in fewer oxygen vacancies, enhanced crystallization, lower strain, lower surface roughness, and higher thin-film density, as well as improved surface energy and adhesion properties of the gallium zinc oxide source/drain electrodes. The UV-ozone 16-min ZnO active layer TFT with the preferable resistivity values by Hall measurement results. The optimal UV-ozone treatment time (16 min) led to the smallest full-width at half-maximum (0.4138 ° ), smallest strain (2.61x 10-3) , highest thin-film density (5.78~ g/ cm3) , lowest surface roughness (1.75 nm), and largest surface energy (65.3~ mJ/ m2) . The saturation mobility, subthreshold voltage, ON/OFF current ratio, and trap density of the ZnO TFTs with optimal UV-ozone treatment were 4.54 cm2~ V-1~ S-1 , 0.28 V/decade, 2.02x 107 , and 2.61x 1011~ eV-1~ cm-2 , respectively, indicating the potential of this structure to be applied to large-area flat-panel displays.