Your Search Results

Use this resource - and many more! - in your textbook!

AcademicPub holds over eight million pieces of educational content for you to mix-and-match your way.

Experience the freedom of customizing your course pack with AcademicPub!
Not an educator but still interested in using this content? No problem! Visit our provider's page to contact the publisher and get permission directly.

In-situ oxygen x-ray absorption spectroscopy investigation of the resistance modulation mechanism in LiNbO2 memristors

By: Jordan D. Greenlee; Cole F. Petersburg; W. Laws Calley; Cherno Jaye; Daniel A. Fischer; Faisal M. Alamgir; W. Alan Doolittle;

2012 / American Institute of Physics


In situ near edge x-ray absorption fine structure spectroscopy (NEXAFS) is performed on LiNbO2 analog memristors to identify the underlying analog resistance modulation mechanism. Empty electronic state gradients in the NEXAFS difference spectra are observed in biased devices indicating a gradual movement of lithium. This movement of lithium supports the assertion that simple ion dopant drift and diffusion dominate the analog memristor’s resistance response. By identifying the physical memristance mechanism in analog LiNbO2 memristors, suggestions are made for additions to the memristor to modify device performance for both neuromorphic computing and memory applications.

Related Topics