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Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application

By: J. H. Lee; Y. S. Yoon; M. J. Kim;

2012 / American Institute of Physics

Description

The floating harmonic method was developed for in situ plasma diagnostics of allowing real time measurement of electron temperature (Te) and ion flux (Jion) without contamination of the probe from surface modification by reactive species. In this study, this novel non-invasive diagnostic system was studied to characterize inductively coupled plasma of reactive gases monitoring Te and Jion for investigating the optimum plasma etching conditions and controlling of the real-time plasma surface reaction in the range of 200–900 W source power, 10–100 W bias power, and 3–15 mTorr chamber pressure, respectively.

Related Topics
Harmonic Analysis