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An improved fast Id-Vg measurement technology with expanded application range

By: Yu, L.C.; Wang, C.; Zhang, D.W.; Suehle, J.S.; Campbell, J.P.; Ye, P.D.; Xuan, Y.; Cheung, K.P.;

2009 / IEEE / 978-1-4244-3921-8

Description

This item was taken from the IEEE Conference ' An improved fast Id-Vg measurement technology with expanded application range ' Fast Id-Vg measurements on very high performance devices (very low channel ON-resistance) and larger area devices (therefore large gate capacitance) are subject to serious distortions. Methods to minimize these distortions are introduced in this paper; thus expanding the applicable range of this important measurement technique.