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Gate stack technology for nanoscale devices
2006 / IEEE / 978-1-4244-0540-4
This item was taken from the IEEE Conference ' Gate stack technology for nanoscale devices ' The historical evolution of gate stack technology for silicon devices is reviewed to provide insight on the challenges in this technology for scaled nanoscale CMOS devices and non-Sibased devices.
Gate Stack Technology
High-k Gate Dielectrics
High K Dielectric Materials
High Transport Channel
Cmos Integrated Circuits
Scaled Nanoscale Cmos Devices