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25nm Short and Narrow Strained FDSOI with TiN/HfO2 Gate Stack

By: Dupre, C.; Rochette, F.; Andrieu, F.; Deleonibus, S.; Mazure, C.; Gaud, P.; Grampeix, H.; Colonna, J.P.; Previtali, B.; Dansas, H.; Lafond, D.; Jahan, C.; Fenouillet-Beranger, C.; Ernst, T.; Denorme, S.; Vandooren, A.; Cluzel, J.; Barbe, J.C.; Allain, F.; Brevard, L.; Cayrefoureq, I.; Ghyselen, B.; Casse, M.; Rouchouze, E.; Buj, C.; Tosti, L.; Faynot, O.;

2006 / IEEE / 1-4244-0005-8

Description

This item was taken from the IEEE Conference ' 25nm Short and Narrow Strained FDSOI with TiN/HfO2 Gate Stack '