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A Source of Ultra-Low-Energy High Intensity Gaseous Ions Based on Discharge with Electron Injection
By: Yushkov, G.Yu.; Oks, E.M.; Shandrikov, M.V.; Vizir, A.V.; Baldwin, D.A.; Anders, A.;
2005 / IEEE / 0-7803-9300-7
Description
This item was taken from the IEEE Conference ' A Source of Ultra-Low-Energy High Intensity Gaseous Ions Based on Discharge with Electron Injection '
Related Topics
Plasma Transport Processes
Ar
Electron Injection
Biased Target Deposition
Sputtering Technique
Nanostructure Fabrication
Hall Current Ion Sources
High-current Gaseous Discharge
Electron Acceleration
Ionization
Ion Beam Current
Ion Energy Spread
35 A
Fault Location
Electrons
Ion Sources
Sputtering
Argon
Fabrication
Thin Film Devices
Nanoscale Devices
Atomic Layer Deposition
Kinetic Energy
Plasma Sources
Plasma Materials Processing
Ionisation
Discharges (electric)
Argon
Sputter Deposition
Engineering
Thin Film Fabrication
