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Full-chip implementation of IDEALsmile on 90nm node devices with ArF lithography

By: Yamazoe, K.; Cantu, P.; Saitoh, K.; Suzuki, A.; Kuno, T.; Pepe, A.; Lupo, M.; Loi, S.; Toublan, O.; Iwasa, J.; Hasegawa, Y.; Evangelista, E.; Capetti, G.;

2004 / IEEE / 4-99024720-5

Description

This item was taken from the IEEE Conference ' Full-chip implementation of IDEALsmile on 90nm node devices with ArF lithography '