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Comparison between ultra-thin ZrO/sub 2/ and ZrO/sub x/N/sub y/ gate dielectrics in TaN or poly-gated NMOSCAP and NMOSFET devices
By: Chang Seok Kang; Hag-Ju Cho; Krishnan, S.; Nieh, R.; Gopalan, S.; Lee, J.C.; Choi, R.; Onishi, K.;
2002 / IEEE / 0-7803-7312-X
This item was taken from the IEEE Conference ' Comparison between ultra-thin ZrO/sub 2/ and ZrO/sub x/N/sub y/ gate dielectrics in TaN or poly-gated NMOSCAP and NMOSFET devices ' Both NMOSCAP and self-aligned NMOSFET devices using TaN gates were fabricated and characterized in order to compare ZrO/sub 2/ and nitrogen-incorporated ZrO/sub 2/ (ZrO/sub x/N/sub y/) gate dielectrics (EOT/spl sim/10.3/spl Aring/). ZrO/sub x/N/sub y/ devices demonstrated excellent thermal stability, comparable leakage current, higher breakdown field, decreased subthreshold swing, and improved drive current over ZrO/sub x/ devices. Polysilicon-gated NMOSCAPs were also fabricated to investigate the compatibility of ZrO/sub x/N/sub y/ with the poly process (EOT/spl sim/19/spl Aring/), but high leakage and TEM analysis revealed interaction between the poly and ZrO/sub x/N/sub y/.
Transmission Electron Microscopy
Zro/sub X/n/sub Y/
Ultra-thin Zro/sub 2/ Gate Dielectrics
Ultra-thin Zro/sub X/n/sub Y/ Gate Dielectrics
Self-aligned Nmosfet Devices
Very Large Scale Integration
Dielectric Thin Films