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Nanosecond high current and high repetition rate electron source
1998 / IEEE / 0-7803-3953-3
This item was taken from the IEEE Conference ' Nanosecond high current and high repetition rate electron source ' A broad electron beam source with a plasma hollow cathode has been developed which is intended for the production of nanosecond electron beams with a high repetition rate. The source lifetime is over 10/sup 9/ shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 keV, a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced.
Pulsed Power Technology
Broad Electron Beam Source
Plasma Hollow Cathode
Nanosecond Electron Beam Production
Pulse Repetition Rate
Plasma Formation Time
Auxiliary Triggering Glow Discharge
50 To 1000 Hz
Power Supplies To Apparatus