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Nanosecond high current and high repetition rate electron source

By: Schanin, P.M.; Koval, N.N.; Gushenets, V.I.; Tolkachev, V.S.;

1998 / IEEE / 0-7803-3953-3

Description

This item was taken from the IEEE Conference ' Nanosecond high current and high repetition rate electron source ' A broad electron beam source with a plasma hollow cathode has been developed which is intended for the production of nanosecond electron beams with a high repetition rate. The source lifetime is over 10/sup 9/ shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 keV, a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced.