Use this resource - and many more! - in your textbook!
AcademicPub holds over eight million pieces of educational content for you to mix-and-match your way.
Anomalous dielectric dispersion in tantalum oxide films prepared by RF sputtering
By: Miyairi, K.;
1998 / IEEE / 0-7803-4237-2
This item was taken from the IEEE Conference ' Anomalous dielectric dispersion in tantalum oxide films prepared by RF sputtering ' Dielectric properties (/spl epsiv/ and tan /spl delta/) of thin sputtered tantalum oxide films have been measured in the low frequency range. Anomalous large values of /spl epsiv/ and tan /spl delta/ have been observed at high temperatures above 100/spl deg/C. The explicit thickness dependence exists in the frequency dependence of /spl epsiv/ and tan /spl delta/. These results have been interpreted by Maxwell-Wagner theory.
Ta/sub 2/o/sub 5/
Tantalum Oxide Film
Dielectric Thin Films