Your Search Results

Use this resource - and many more! - in your textbook!

AcademicPub holds over eight million pieces of educational content for you to mix-and-match your way.

Experience the freedom of customizing your course pack with AcademicPub!
Not an educator but still interested in using this content? No problem! Visit our provider's page to contact the publisher and get permission directly.

Manufacturable Shallow-junction Processes To Overcome Defect Formation And Dopant Reactions For Sub-0.18/spl mu/m CMOS Technologies

By: Liu, C.T.; Baumann, F.H.; Vuong, H.H.; Psi, C.S.; Eaglesham, D.J.; Liu, R.; Chang, C.P.; Hillenius, S.J.; Cheung, K.P.; Colonell, J.I.; Lai, W.Y.C.;

1997 / IEEE / 4-930813-75-1

Description

This item was taken from the IEEE Conference ' Manufacturable Shallow-junction Processes To Overcome Defect Formation And Dopant Reactions For Sub-0.18/spl mu/m CMOS Technologies '

Related Topics
Engineering