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YBaCuO thin film deposition by pulsed plasma discharges
By: Nakazono, T.; Suda, Y.; Ebihara, K.;
1993 / IEEE / 0-7803-1462-X
This item was taken from the IEEE Periodical ' YBaCuO thin film deposition by pulsed plasma discharges ' A pulsed arc plasma discharge and off-axis magnetron sputtering were used to sputter YBa/sub 2/Cu/sub 3/O/sub 7-x/ bulk targets and deposit YBaCuO thin films on MgO
Superconducting Thin Films
Thin Film Deposition
Pulsed Plasma Discharges
Off-axis Magnetron Sputtering
0.4 To 0.5 Kv
2500 To 8600 K
Yba/sub 2/cu/sub 3/o/sub 7-x/
Yttrium Barium Copper Oxide
Plasma Materials Processing