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Error and Correction in Capacitance–Voltage Measurement Due to the Presence of Source and Drain
By: Choi, R.; Cheung, K.P.; Wang, Y.; Lee, B.-H.; Brown, G.A.;
2007 / IEEE
This item was taken from the IEEE Periodical ' Error and Correction in Capacitance–Voltage Measurement Due to the Presence of Source and Drain ' MOS capacitor with highly leaky gate dielectric requires source and drain to support the inversion charges. This transistor-like capacitor for capacitance-voltage ( -) measurement has become popular due to the need of accurately measuring inversion capacitance. The source and drain overlap capacitance is an unavoidable error and must be quantified. Although it is possible to measure the overlap capacitance directly, conventional method is not reliable due to high leakage. Here, we show that this error can be corrected in the new time-domain-reflectometry - measurement method introduced recently for highly leaky capacitors.
Electrical Resistance Measurement
Time Domain Reflectrometry
Components, Circuits, Devices And Systems
Engineered Materials, Dielectrics And Plasmas