Your Search Results

Use this resource - and many more! - in your textbook!

AcademicPub holds over eight million pieces of educational content for you to mix-and-match your way.

Experience the freedom of customizing your course pack with AcademicPub!
Not an educator but still interested in using this content? No problem! Visit our provider's page to contact the publisher and get permission directly.

A capacitance-based methodology for work function extraction of metals on high-/spl kappa/

By: Misra, V.; Lee, J.; Choi, R.; Kim, Y.H.; Gurganos, J.; Jha, R.;

2004 / IEEE

Description

This item was taken from the IEEE Periodical ' A capacitance-based methodology for work function extraction of metals on high-/spl kappa/ ' This letter presents a methodology to accurately extract the work function of metal electrodes on high-/spl kappa/ dielectrics with various charge distributions. A mathematical analysis including sources of errors was used to study the effect of charge distribution in gate dielectric stacks on the flatband voltage of the device. The calculations are verified by experimental results obtained for Ru-Ta alloys on HfO/sub 2/ and SiO/sub 2/ gate dielectric stacks. It is shown that accounting for the appropriate charge model is imperative for accurate calculation of workfunction on high-/spl kappa//SiO/sub 2/ gate dielectric stacks.