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Author: Sempere, G.
Ultra shallow junctions fabrication by Plasma Immersion Implantation on PULSION� followed by different annealing processes2008 / IEEE / 978-1-4244-1737-7
By: Roux, L.; Fazzini, P.F.; Cristiano, F.; Delaporte, P.; Sempere, G.; Torregrosa, F.; Vervisch, V.; Etienne, H.; Sarnet, T.;