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Author: Minha Seo
Improvements in the electrical properties of high-k HfO2 dielectric films on Si1xGex substrates by postdeposition annealing2007 / American Institute of Physics
By: Tae Joo Park; Jeong Hwan Kim; Jae Hyuk Jang; Minha Seo; Cheol Seong Hwang; Jeong Yeon Won;
Impact of O3 feeding time on TiO2 films grown by atomic layer deposition for memory capacitor applications2007 / American Institute of Physics
By: Seong Keun Kim; Sang Young Lee; Minha Seo; Gyu-Jin Choi; Cheol Seong Hwang;
Influence of the oxygen concentration of atomic-layer-deposited HfO2 gate dielectric films on the electron mobility of polycrystalline-Si gate transistors2006 / American Institute of Physics
By: Jaehoo Park; Tae Joo Park; Moonju Cho; Seong Keun Kim; Sug Hun Hong; Jeong Hwan Kim; Minha Seo; Cheol Seong Hwang; Jeong Yeon Won; Ranju Jeong; Jung-Hae Choi;