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Author: Hu, C-K.
Performance of ultrathin alternative diffusion barrier metals for next - Generation BEOL technologies, and their effects on reliability2014 / IEEE
By: Nogami, T.; Chae, M.; Edelstein, D.; Spooner, T.; Huang, E.; Bonilla, G.; Motoyama, K.; Simon, A.; Straten, O.; Penny, C.; Shaw, T.; Shobha, H.; Li, J.; Cohen, S.; Hu, C-K.; Zhang, X.; He, M.; Tanwar, K.; Patlolla, R.; Chen, S-T.; Kelly, J.; Lin, X.;