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Author: Banti, J.
Effective Modulation of Ni Silicide Schottky Barrier Height Using Chlorine Ion Implantation and Segregation2009 / IEEE
By: Hsing-Huang Tseng; Jammy, R.; Radar, K.; Sassman, B.; Jungwoo Oh; Pui-Yee Hung; Roux, L.; Majhi, P.; Banti, J.; Torregrosa, F.; Spiegel, Y.; Turnbaugh, D.; Ok, I.; Coss, B.; Etienne, H.; Wei-Yip Loh;